FACILITIES

Equipment guide

X-ray diffractometer

Inorganic microcrystal structure analyzer (VariMax Dual)

Inorganic microcrystal structure analyzer (VariMax Dual)

Inorganic microcrystal structure analyzer VariMax Dual / Rigaku

X-ray source 1.2kW generator
Effective luminance 31kW/mm2/
Mo/Cu target
X-ray optics (VariMax Dual) Curved artificial multilayer mirror Optical element compatible with both Mo and Cu wavelengths
Detector High-sensitivity, wide-dynamic-range two-dimensional detector enables rapid measurement
Features Seamless measurement is possible by continuously driving the goniometer with the shutter open.
Crystals can be cooled down to -180℃

・ It is possible to analyze the structure of microcrystals such as low-molecular-weight and proteinaceous crystals of several tens of μm square or less, and crystals with a piece of 10 μm or less, which until now had been difficult to measure diffraction intensity without synchrotron radiation.
・By combining a high-intensity X-ray source and a curved artificial multilayer mirror, it is possible to direct high-intensity X-rays to the crystal position.
・ Both Mo and Cu radiation sources can be used, and structural analysis of inorganic and organic compounds can be measured without depending on the radiation source.

High brightness In-plane type X-ray diffractometer (SmartLab (9kW))

High brightness In-plane type X-ray diffractometer (SmartLab (9kW))

SmartLab/Rigaku

X-ray source 9kW rotating anticathode X-ray generator/Cu target
Optical system Focusing method, multilayer parallel beam method, thin film high-resolution parallel beam method, in-plane optical system
Detector HyPix-3000

・ This is an X-ray diffractometer that uses a high-intensity X-ray source and a high-precision goniometer with a horizontally arranged sample equipped with an In-Plane arm.
・ A simple unit for X-ray reflectance measurement, reciprocal lattice map measurement, rocking curve measurement, etc., using a focusing optical system suitable for powder sample measurement and a parallel beam optical system using a multilayer mirror suitable for thin film sample measurement. It is possible to use it by rearranging it by exchanging.
・ Equipped with an in-plane arm, evaluation of ultra-thin films and complete pole measurement are possible.

Powder X-ray diffractometer (SmartLab (3kW))

Powder X-ray diffractometer (SmartLab (3kW))

SmartLab/Rigaku

X-ray source 3 kW enclosed X-ray tube/Cu target
Optical system Concentration method, multilayer film parallel beam method, in-plane optical system
Detector Scintillation detector, one-dimensional semiconductor detector
heating options AntonPaar DHS900 attachment (room temperature to 900°C) (air, vacuum)

・ A focusing optical system suitable for powder sample measurement and a parallel beam optical system using a multi-layer film mirror suitable for thin film sample measurement.
・ An X-ray diffractometer using a high-precision goniometer with horizontal sample placement equipped with an In-Plane arm.
・ An attachment for high temperature measurement up to 900°C is also available.

Powder X-ray diffractometer (SmartLab (Kα1))

Powder X-ray diffractometer (SmartLab (Kα1))

SmartLab/Rigaku

X-ray source 3 kW enclosed X-ray tube/Cu target
Optical system concentration method, convergence method
Detector Scintillation detector, one-dimensional semiconductor detector
Options Using a symmetrical Johansson-type crystal, it is possible to measure with X-rays monochromatic to Cu Kα1 line.
Capillary rotation measurement is possible
Transmittance measurement with a condenser mirror is possible

High-intensity, high-angle-resolution measurements are possible with an optical system using a symmetrical Johansson-type crystal.Demonstrates power in powder X-ray diffraction, etc.High-intensity transmission measurement using a focusing mirror is possible.