X-ray diffractometer
Inorganic microcrystal structure analyzer (VariMax Dual)
Inorganic microcrystal structure analyzer VariMax Dual / Rigaku
X-ray source | 1.2kW generator Effective luminance 31kW/mm2/ Mo/Cu target |
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X-ray optics (VariMax Dual) | Curved artificial multilayer mirror Optical element compatible with both Mo and Cu wavelengths |
Detector | High-sensitivity, wide-dynamic-range two-dimensional detector enables rapid measurement |
Features | Seamless measurement is possible by continuously driving the goniometer with the shutter open. Crystals can be cooled down to -180℃ |
・ It is possible to analyze the structure of microcrystals such as low-molecular-weight and proteinaceous crystals of several tens of μm square or less, and crystals with a piece of 10 μm or less, which until now had been difficult to measure diffraction intensity without synchrotron radiation.
・By combining a high-intensity X-ray source and a curved artificial multilayer mirror, it is possible to direct high-intensity X-rays to the crystal position.
・ Both Mo and Cu radiation sources can be used, and structural analysis of inorganic and organic compounds can be measured without depending on the radiation source.
High brightness In-plane type X-ray diffractometer (SmartLab (9kW))
SmartLab/Rigaku
X-ray source | 9kW rotating anticathode X-ray generator/Cu target |
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Optical system | Focusing method, multilayer parallel beam method, thin film high-resolution parallel beam method, in-plane optical system |
Detector | HyPix-3000 |
・ This is an X-ray diffractometer that uses a high-intensity X-ray source and a high-precision goniometer with a horizontally arranged sample equipped with an In-Plane arm.
・ A simple unit for X-ray reflectance measurement, reciprocal lattice map measurement, rocking curve measurement, etc., using a focusing optical system suitable for powder sample measurement and a parallel beam optical system using a multilayer mirror suitable for thin film sample measurement. It is possible to use it by rearranging it by exchanging.
・ Equipped with an in-plane arm, evaluation of ultra-thin films and complete pole measurement are possible.
Powder X-ray diffractometer (SmartLab (3kW))
SmartLab/Rigaku
X-ray source | 3 kW enclosed X-ray tube/Cu target |
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Optical system | Concentration method, multilayer film parallel beam method, in-plane optical system |
Detector | Scintillation detector, one-dimensional semiconductor detector |
heating options | AntonPaar DHS900 attachment (room temperature to 900°C) (air, vacuum) |
・ A focusing optical system suitable for powder sample measurement and a parallel beam optical system using a multi-layer film mirror suitable for thin film sample measurement.
・ An X-ray diffractometer using a high-precision goniometer with horizontal sample placement equipped with an In-Plane arm.
・ An attachment for high temperature measurement up to 900°C is also available.
Powder X-ray diffractometer (SmartLab (Kα1))
SmartLab/Rigaku
X-ray source | 3 kW enclosed X-ray tube/Cu target |
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Optical system | concentration method, convergence method |
Detector | Scintillation detector, one-dimensional semiconductor detector |
Options | Using a symmetrical Johansson-type crystal, it is possible to measure with X-rays monochromatic to Cu Kα1 line. Capillary rotation measurement is possible Transmittance measurement with a condenser mirror is possible |
High-intensity, high-angle-resolution measurements are possible with an optical system using a symmetrical Johansson-type crystal.Demonstrates power in powder X-ray diffraction, etc.High-intensity transmission measurement using a focusing mirror is possible.